Superconductivity in hyperdoped Ge by molecular beam epitaxy

نویسندگان

چکیده

Superconducting germanium films are an intriguing material for possible applications in fields such as cryogenic electronics and quantum bits. Recently, there has been a great deal of progress hyperdoping Ga doped Ge using ion implantation. Thin film growth would be advantageous, allowing homoepitaxy undoped opening possibilities vertical Josephson junctions. Here, we present our studies on the one layer hyperdoped superconducting thin via molecular beam epitaxy. We observe fragile phase, which is extremely sensitive to processing conditions can easily phase-segregate, forming percolated network pure gallium metal. By suppressing phase segregation through temperature control, find that unique appears coherent underlying substrate.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Growth of InN on Ge substrate by molecular beam epitaxy

InN epitaxial growth on a (1 1 1)-oriented, Ga-doped germanium substrate using molecular beam epitaxy is described. X-ray diffraction and transmission electron microscopy investigations have shown that the InN epitaxial layer consists of a wurtzite structure, which has the epitaxial relationship of (0 0 0 1)InNJ(1 1 1)Ge. Transmission electron microscopy shows an intermediate layer at the inter...

متن کامل

Ferromagnetism of Mn/Ge Multilayers Grown by Molecular Beam Epitaxy

We report on novel ferromagnetic Mn/Ge multilayers for spintronics applications investigated both experimentally and theoretically. Two Mn/Ge multilayers are grown on GaAs (001) substrates by molecular beam epitaxy. The period of each multilayer consists of an Mn layer of varying thickness (0.6 and 5 Å) and a 10 Å thick Ge spacer layer. From temperaturedependent magnetization and hysteresis loo...

متن کامل

Ge films grown on Si substrates by molecular - beam epitaxy below 450 ° C

Ge thin films are grown on Si~001! substrates by molecular-beam epitaxy at 370 °C. The low-temperature epitaxial growth is compatible with the back-end thermal budget of current generation complementary metal-oxide-semiconductor technology, which is restricted to less than 450 °C. Reflection high-energy electron diffraction shows that single-crystal Ge thin films with smooth surfaces could be a...

متن کامل

Characterization of GaAs grown by molecular beam epitaxy on vicinal Ge„100... substrates

In this article we investigate the growth of GaAs on two different vicinal surfaces of Ge ~100!, cut 6° off the ~100! plane toward the ~110! plane or toward the ~111! plane. Both substrates exhibit evidence of a regular array of double steps. Ge substrates and GaAs films are characterized with low energy electron diffraction, low temperature photoluminescence, scanning tunneling microscopy, ele...

متن کامل

A p-Ge C /n-Si Heterojunction Diode Grown by Molecular Beam Epitaxy

We report on the fabrication and characterization of the first p-n diode made from a heterojunction of epitaxial p-type Ge0:998C0:002 on an n-type Si substrate. Epitaxial Ge0:998C0:002 was grown on a (100) Si substrate by solid source molecular beam epitaxy. The p-GeC/n-Si junction exhibits diode rectification. The I-V characteristics of the p-GeC/n-Si diode indicate a reasonable reverse satura...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: AIP Advances

سال: 2023

ISSN: ['2158-3226']

DOI: https://doi.org/10.1063/5.0157509